Materials Library Visualization
"Path" "Name" "Value" "Unit"
"general process parameters => start vacuum" "start vacuum" "3.4E-8" "Torr"
"general process parameters => process duration" "process duration" "1900" "s"
"general process parameters => substrate temperature" "substrate temperature" "25.3" "°C"
"general process parameters => substrate rotation" "substrate rotation" "10" "RPM"
"general process parameters => process gas" "process gas" "Ar" ""
"general process parameters => reactive gas 1" "reactive gas 1" "-" ""
"general process parameters => flow RG 1" "flow RG 1" "-" "sccm"
"general process parameters => flow RG 2" "flow RG 2" "-" "sccm"
"general process parameters => reactive gas 2" "reactive gas 2" "-" ""
"general process parameters => table height" "table height" "91.6" "mm"
"general process parameters => substrate position" "substrate position" "-34.3" "°"
"general process parameters => process pressure" "process pressure" "5" "mTorr"
"general process parameters => flow PG" "flow PG" "50" "sccm"
"general process parameters => end vacuum" "end vacuum" "1.9E-7" "Torr"
"target source configuration => Cathode 1 => Mag1-RF => ignition power cathode 1" "ignition power cathode 1" "60" "W"
"target source configuration => Cathode 1 => Mag1-RF => ramp power step cathode 1" "ramp power step cathode 1" "-" "W"
"target source configuration => Cathode 1 => Mag1-RF => duration per step cathode 1" "duration per step cathode 1" "-" "s"
"target source configuration => Cathode 1 => Mag1-RF => pre clean power 1" "pre clean power 1" "60" "W"
"target source configuration => Cathode 1 => Mag1-RF => pre clean time 1" "pre clean time 1" "100" "s"
"target source configuration => Cathode 1 => Mag1-RF => pre clean pressure cathode 1" "pre clean pressure cathode 1" "20" "mTorr"
"target source configuration => Cathode 1 => Mag1-RF => target material 1" "target material 1" "Pt" ""
"target source configuration => Cathode 1 => Mag1-RF => target 1 ID" "target 1 ID" "1" ""
"target source configuration => Cathode 1 => Mag1-RF => power forward cathode 1" "power forward cathode 1" "180" "W"
"target source configuration => Cathode 1 => Mag1-RF => power reflected cathode 1" "power reflected cathode 1" "0" "W"
"target source configuration => Cathode 1 => Mag1-RF => voltage cathode 1" "voltage cathode 1" "-" "V"
"target source configuration => Cathode 1 => Mag1-RF => load cathode 1" "load cathode 1" "-" "%"
"target source configuration => Cathode 1 => Mag1-RF => tune cathode 1" "tune cathode 1" "-" "%"
"target source configuration => Cathode 1 => Mag1-RF => deposition rate 1" "deposition rate 1" "0.079" "nm/s"
Chart
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Y axis:
CSV Viewer: Synthesis for Sample 6751 (single material, 220325-K2-5)
| Path | Name | Value | Unit |
|---|---|---|---|
| general process parameters => start vacuum | start vacuum | 3.4E-8 | Torr |
| general process parameters => process duration | process duration | 1900 | s |
| general process parameters => substrate temperature | substrate temperature | 25.3 | °C |
| general process parameters => substrate rotation | substrate rotation | 10 | RPM |
| general process parameters => process gas | process gas | Ar | |
| general process parameters => reactive gas 1 | reactive gas 1 | - | |
| general process parameters => flow RG 1 | flow RG 1 | - | sccm |
| general process parameters => flow RG 2 | flow RG 2 | - | sccm |
| general process parameters => reactive gas 2 | reactive gas 2 | - | |
| general process parameters => table height | table height | 91.6 | mm |
| general process parameters => substrate position | substrate position | -34.3 | ° |
| general process parameters => process pressure | process pressure | 5 | mTorr |
| general process parameters => flow PG | flow PG | 50 | sccm |
| general process parameters => end vacuum | end vacuum | 1.9E-7 | Torr |
| target source configuration => Cathode 1 => Mag1-RF => ignition power cathode 1 | ignition power cathode 1 | 60 | W |
| target source configuration => Cathode 1 => Mag1-RF => ramp power step cathode 1 | ramp power step cathode 1 | - | W |
| target source configuration => Cathode 1 => Mag1-RF => duration per step cathode 1 | duration per step cathode 1 | - | s |
| target source configuration => Cathode 1 => Mag1-RF => pre clean power 1 | pre clean power 1 | 60 | W |
| target source configuration => Cathode 1 => Mag1-RF => pre clean time 1 | pre clean time 1 | 100 | s |
| target source configuration => Cathode 1 => Mag1-RF => pre clean pressure cathode 1 | pre clean pressure cathode 1 | 20 | mTorr |
| target source configuration => Cathode 1 => Mag1-RF => target material 1 | target material 1 | Pt | |
| target source configuration => Cathode 1 => Mag1-RF => target 1 ID | target 1 ID | 1 | |
| target source configuration => Cathode 1 => Mag1-RF => power forward cathode 1 | power forward cathode 1 | 180 | W |
| target source configuration => Cathode 1 => Mag1-RF => power reflected cathode 1 | power reflected cathode 1 | 0 | W |
| target source configuration => Cathode 1 => Mag1-RF => voltage cathode 1 | voltage cathode 1 | - | V |
| target source configuration => Cathode 1 => Mag1-RF => load cathode 1 | load cathode 1 | - | % |
| target source configuration => Cathode 1 => Mag1-RF => tune cathode 1 | tune cathode 1 | - | % |
| target source configuration => Cathode 1 => Mag1-RF => deposition rate 1 | deposition rate 1 | 0.079 | nm/s |