Synthesis for Sample 6751 (single material, 220325-K2-5)
Type: Synthesis show more
ObjectId: 10367 ExternalId: 58421
Created: 6/4/2023 10:34:43 PM by INF) Dudarev Victor [vic_dudarev@mail.ru]
Updated: 7/13/2026 10:21:27 AM by C02) Perez Mendoza Alejandro Esteban [alejandro.perez-mendoza@uni-due.de]
Access: Public Sort Code (asc): -98
License: CC BY 4.0
Description: Synthesis for Sample 6751 (single material, 220325-K2-5, K6 - Gero, 150 nm Pt on Si+SiO2)
[no file attached]
Referenced Objects (Reverse Association)
-
Sample 6751 Pt
SampleSample for (Pt at Si + SiO2, ID=0006751, K2) by Zehl Rico.
All properties (except table)
| Type | Name | Value | Comment |
|---|
The table
| Path | Name | Value | Unit |
|---|---|---|---|
| general process parameters => start vacuum | start vacuum | 3.4E-8 | Torr |
| general process parameters => process duration | process duration | 1900 | s |
| general process parameters => substrate temperature | substrate temperature | 25.3 | °C |
| general process parameters => substrate rotation | substrate rotation | 10 | RPM |
| general process parameters => process gas | process gas | Ar | |
| general process parameters => reactive gas 1 | reactive gas 1 | - | |
| general process parameters => flow RG 1 | flow RG 1 | - | sccm |
| general process parameters => flow RG 2 | flow RG 2 | - | sccm |
| general process parameters => reactive gas 2 | reactive gas 2 | - | |
| general process parameters => table height | table height | 91.6 | mm |
| general process parameters => substrate position | substrate position | -34.3 | ° |
| general process parameters => process pressure | process pressure | 5 | mTorr |
| general process parameters => flow PG | flow PG | 50 | sccm |
| general process parameters => end vacuum | end vacuum | 1.9E-7 | Torr |
| target source configuration => Cathode 1 => Mag1-RF => ignition power cathode 1 | ignition power cathode 1 | 60 | W |
| target source configuration => Cathode 1 => Mag1-RF => ramp power step cathode 1 | ramp power step cathode 1 | - | W |
| target source configuration => Cathode 1 => Mag1-RF => duration per step cathode 1 | duration per step cathode 1 | - | s |
| target source configuration => Cathode 1 => Mag1-RF => pre clean power 1 | pre clean power 1 | 60 | W |
| target source configuration => Cathode 1 => Mag1-RF => pre clean time 1 | pre clean time 1 | 100 | s |
| target source configuration => Cathode 1 => Mag1-RF => pre clean pressure cathode 1 | pre clean pressure cathode 1 | 20 | mTorr |
| target source configuration => Cathode 1 => Mag1-RF => target material 1 | target material 1 | Pt | |
| target source configuration => Cathode 1 => Mag1-RF => target 1 ID | target 1 ID | 1 | |
| target source configuration => Cathode 1 => Mag1-RF => power forward cathode 1 | power forward cathode 1 | 180 | W |
| target source configuration => Cathode 1 => Mag1-RF => power reflected cathode 1 | power reflected cathode 1 | 0 | W |
| target source configuration => Cathode 1 => Mag1-RF => voltage cathode 1 | voltage cathode 1 | - | V |
| target source configuration => Cathode 1 => Mag1-RF => load cathode 1 | load cathode 1 | - | % |
| target source configuration => Cathode 1 => Mag1-RF => tune cathode 1 | tune cathode 1 | - | % |
| target source configuration => Cathode 1 => Mag1-RF => deposition rate 1 | deposition rate 1 | 0.079 | nm/s |